Nanoimprint lithography (NIL) is a promising technique for fine-patterning with a lower cost than other lithography techniques such as EUV or immersion with multi-patterning. NIL has the potential of ...
Nanometrics, Inc., a leading supplier of advanced integrated and stand-alone metrology equipment for the semiconductor industry, today introduced the newest version of its overlay control system, the ...
New EVG ® 40 D2W overlay metrology system provides 100 percent overlay measurement on every die at up to 15X higher throughput versus industry benchmark ST. FLORIAN, Austria, Sept. 8, 2025 /PRNewswire ...
“In order to continue scaling devices to meet Moore's law, chip manufacturers are extending 193nm immersion lithography using multi-patterning techniques and are assessing non-traditional patterning ...
Chipmakers continue to migrate to the next node, but there are signs that traditional IC scaling is slowing down. So what’s causing the slowdown? Or for that matter, what could ultimately undo ? It ...
(MENAFN- PR Newswire) The EVG40 D2W can be used for any D2W bonding application, including chiplet integration, high-bandwidth memory (HBM) stacks, and 3D system on chip (SoC) integration processes, ...
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